High resolution
sputter coater
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Chamber size
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150mm Ø (5.9")
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Sputter head
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Planar magnetron
Wrap-around dark-space shield
Shutter for target conditioning
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Sputter target
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28mm diameter
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Sputter supply
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Microprocessor based
Safety interlocked
Current control independent of vacuum
Digitally selectable current (20, 40, 60 or 80mA)
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Sample stage
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Non-repetitive rotary planetary motion with manual tilt
Variable speed rotation
Crystal head
4 sample holders
(click to view photo)
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Analogue metering
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Vacuum, Atm - 0.001mb
Current, 0 - 100mA
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Control method
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Automatic process sequencing
Full manual override
Automatic vent
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Thickness control
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MTM-20 with termination facility
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Pumping system
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Configuration
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Turbo-drag/diaphragm pump pump combination
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Pumpdown time
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Approx. 10 min. to 4 x 10-5 mb
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Ultimate pressure
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Approx. 8 x 10-6 mb
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Desktop system
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Backing pump is mounted on desktop compatible anti-vibration table
All metal vacuum coupling system
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Services required
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Supply
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100 - 120 or 200 - 240 VAC, 50/60Hz
(specify on order)
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Power
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550 VA max.
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Argon gas
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Purity, min. 99.9%
Pressure, regulated 7 - 8 psi (0.5 - 0.6 bar)
Hose connection, 6.0mm (¼")
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System dimensions
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Size
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Width 600mm (23.6"), Depth 600mm (23.6"),
Height 450mm (17.7")
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Weight
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40kg (88.5 lbs)
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